was a presence of (had presence) – P195 : Label Back
Candidate
a été une présence de (a eu pour présence)
- Language
- fr
- Is standard label for language
- Yes
OntoME is a LARHRA application, developed and maintained by the Digital History Research Team as part of the Geovistory initiative.
All the contents of this website are licensed under a Creative Commons Licence Attribution-ShareAlike 4.0 International.
Comments
No comment found.